Exposure of self-assembled monolayers to highly charged ions and metastable atoms
نویسندگان
چکیده
The doses of neutral metastable argon atoms (Ar*) and highly charged xenon ions ~HCIs! required to damage self-assembled monolayers ~SAMs! of alkanethiolates on gold are compared in a set of experiments carried out concurrently. The extent of damage to the SAM is determined by developing the samples in a gold etching solution, then measuring the decrease in reflectivity of the gold; '10 Ar* are required to cause the same amount of damage as 1 HCI, as measured by this assay. We have also demonstrated HCI micropatterning of a surface using a physical mask, suggesting the application of this system in lithography. © 1999 American Institute of Physics. @S0003-6951~99!03330-6#
منابع مشابه
Microlithography by using neutral metastable atoms and self-assembled monolayers.
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